Method and Apparatus For Maintaining Depth of Focus

ABSTRACT

A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

CROSS-REFERENCE

This application is a continuation of U.S. patent application Ser. No.13/964,931, filed on Aug. 12, 2013, which is a continuation of U.S. Pat.No. 8,520,189, filed on May 3, 2010, the entirety of which is herebyincorporated by reference.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experienced rapidgrowth. Technological advances in IC materials and design have producedgenerations of ICs where each new generation has smaller and morecomplex circuits than the previous generation. However, these advanceshave increased the complexity of processing and manufacturing ICs and,for these advances to be realized, similar developments in IC processingand manufacturing are needed. In the course of integrated circuitevolution, there has been an increase in functional density (the numberof interconnected devices per chip area) and a decrease in geometricsize (the smallest component or line that can be created using afabrication process). This scaling-down process generally providesbenefits by increasing production efficiency and lowering associatedcosts.

But scaling down presents challenges as well. For instance, as geometricsize and critical dimension (CD) have decreased, it has become moredifficult to obtain optimal photolithography results. Lithography toolshave generally kept up with the scaling down trend by moving to lightsources in the deep ultraviolet spectrum, but problems arise whensmaller wavelength light is used to expose current photoresistmaterials. For example, when a lithography tool's depth of focus issmaller than the thickness of the layer of photoresist to be exposed,only a portion of the layer is actually exposed. Non-uniform exposure ofa layer of photoresist may lead to non-uniform etch patterns and etchbias, ultimately degrading device performance.

Techniques to compensate for inadequate depth of focus have been devisedand are generally adequate for their intended purpose, but they are notentirely satisfactory. For example, some suffer from problems such asunacceptable critical dimension variation (also known as “tiger skin”).

SUMMARY

According to one of the broader forms of the invention, a methodincludes directing a beam of radiation along an optical axis toward aworkpiece support, measuring a spectrum of the beam at a first time toobtain a first spectral profile, measuring the spectrum of the beam at asecond time subsequent to the first time to obtain a second spectralprofile, determining a spectral difference between the first spectralprofile and the second spectral profile, and adjusting a position of theworkpiece support along the optical axis based on the spectraldifference.

According to another of the broader forms of the invention, an apparatusincludes a workpiece support, beam directing structure that directs abeam of radiation along an optical axis toward the workpiece support,spectrum measuring structure that measures a spectrum of the beam atfirst and second times to obtain respective first and second spectralprofiles, the second time being after the first time, processingstructure that determines a spectral difference between the firstspectral profile and the second spectral profile, and support adjustingstructure that adjusts a position of the workpiece support along theoptical axis based on the spectral difference.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isemphasized that, in accordance with the standard practice in theindustry, various features may not be drawn to scale. In fact, thedimensions of the various features may be arbitrarily increased orreduced for clarity of discussion.

FIG. 1 is a diagrammatic sectional side view of a semiconductor waferand shows three photolithography exposures.

FIG. 2 is a diagrammatic side view of an apparatus that is a lithographysystem.

FIG. 3 is a graph depicting spectrum data generated by the lithographysystem in FIG. 2.

FIG. 4 is high-level flowchart showing a process carried out by thelithography system in FIG. 2.

FIG. 5 is a graph depicting critical dimension data for the lithographysystem in FIG. 2.

DETAILED DESCRIPTION

It is to be understood that the following disclosure provides manydifferent embodiments, or examples, for implementing different featuresof the invention. Specific examples of components and arrangements aredescribed below to simplify the present disclosure. These are, ofcourse, merely examples and are not intended to be limiting. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

FIG. 1 is a diagrammatic sectional side view of a semiconductor wafer 10showing three different photolithography exposures. For the sake ofsimplicity, wafer 10 is depicted with only a substrate 12 and aphotoresist layer 14, but wafer 10 may include more layers such as anetch stop layer and a dielectric layer. Photoresist layer 14 has athickness 16 and facilitates the transfer of a reticle pattern to wafer10.

During an exposure 18, a narrowband beam of radiation 20 emitted from anot-illustrated lithography light source exposes a portion of thephotoresist layer 14 of wafer 10. Beam 20 is a spectrum of light in thedeep ultraviolet (DUV) range with a spectral width of approximately 0.3picometers (pm) and a depth of focus 22. As evident from FIG. 1, depthof focus 22 is substantially smaller than thickness 16 of photoresistlayer 14. Consequently, only a portion of the layer 14 is properlyexposed. That is, the layer 14 does not receive uniform exposure fromtop to bottom. Non-uniform exposure of the photoresist layer 14 may leadto non-uniform photoresist development, etch bias, and ultimately,degradation in device performance.

During a different exposure 24, a broadband beam of radiation 26 emittedby a different not-illustrated lithography light source exposes thephotoresist layer 14. Beam 26 is also a spectrum of light in the DUVrange but has a spectral width of approximately 1.2 pm. A largerspectral width means beam 26 contains a plurality of wavelengths, andeach has a different focus plane. In particular, beam 26 passes throughnot-illustrated optics that provide intentional chromatic aberration inorder to increase the depth of focus. Beam 26 has an effective depth offocus 28 that is much larger than the depth of focus 22 of narrowbandbeam 20, and is also larger than thickness 16 of the photoresist layer14. Thus, during exposure 24, the entire thickness 16 of photoresistlayer 14 is exposed, eliminating the possibility of non-uniformity thatcan lead to etch bias during subsequent development of layer 14.

Light sources that emit broadband beams may exhibit spectral shift overthe course of multiple exposures, even if spectral width is maintained.This phenomenon is depicted by an exposure 30 after exposure 24. Duringexposure 30, the same broadband beam 26 exposes the photoresist layer14. Beam 26 has a depth of focus 32 that is approximately the same sizeas depth of focus 28. However, depth of focus 32 is offset verticallywith respect to depth of focus 28 such that it does not align withphotoresist layer 14. Consequently, the entire thickness 16 of layer 14is not uniformly exposed, leading to a possibility of etch bias afterdevelopment. Etch bias may ultimately lead to unwanted variation incritical dimension (CD) at different pitches on wafer 10.

The specific values presented in association FIG. 1 may be larger orsmaller in practice. Further, spectral shift in broadband beams ofradiation may also produce changes in exposure intensity or the size ofthe depth of focus.

FIG. 2 is a diagrammatic side view of an apparatus that is a lithographysystem 110 for the exposure of semiconductor wafers. The lithographysystem 110 includes a broadband light source 112 that produces a beam ofradiation 114 similar to the broadband beam of radiation 26 in FIG. 1.The light source 112 is a excimer laser capable of producing light inthe DUV range. Alternatively, the light source 112 may produce a beam ofradiation in other ranges such as vacuum ultraviolet (VUV) or extremeultraviolet (EUV). The beam 114 includes a broadband range ofwavelengths in the DUV spectrum and has a spectral width ofapproximately 1.2 pm. However, the beam's spectral width mayalternatively be larger or smaller depending on the exposureapplication. Here, spectral width is defined as the spectral distancebetween the two wavelengths that encompass ninety-five percent ofspectral energy of the beam. This method of measuring spectral width iscommonly known as E95.

The beam of radiation 114 is directed along an optical axis 115 throughthe lithography system 110 by optics that include a standard condenserlens 116. The condenser lens 116 is configured to collimate and directthe beam 114 along the optical axis 115 toward a reticle 118. Thereticle 118 is held by a reticle stage 120 at a location along theoptical axis 115 and includes a pattern image to be transferred alongthe optical axis. The reticle stage 120 is configured to adjust theposition of the reticle 118 in directions transverse to the optical axis115 for stepping between exposure fields on a wafer and for aligning thereticle 118 with the optical axis. After passing through the reticle118, the beam 114 passes through a standard projection lens 122 that ispart of the optics. The projection lens 122 is configured to focus thepattern image carried by the beam 114 along the optical axis. Bothcondenser lens 116 and projection lens 122 are exemplary andalternatively may each be a lens group. Once through the projection lens122, a small portion of beam 114 is reflected away from the optical axis115 by a beam splitter 124 that is disposed along the optical axis. Thebeam splitter 124 has a reflection coefficient of less than 5% so as todivert only an insignificant portion of the beam 114 away from theoptical axis. Alternatively, the beam splitter 124 may have a largerreflection coefficient or may intercept the beam 114 at a differentlocation along the optical axis 115, for example between the condenserlens 116 and the reticle 118.

A semiconductor wafer 126 is disposed along the optical axis 115 belowthe beam splitter 124. The wafer 126 includes a plurality of exposurefields that may be successively aligned with the reticle 118 so that thebeam 114 individually exposes each exposure field with the patterncontained on the reticle. A transmission image sensor (TIS) 128 isdisposed immediately next to the wafer 126. The TIS 128 is configured todetect light from the broadband light source 112 and gather alignmentdata for alignment of the wafer 126. Alternatively, the TIS 128 maygather alignment data based upon light from an independent alignmentlight source.

A wafer stage 130 supports the wafer 126 and is configured to movablyposition it for proper alignment along the optical axis. TIS 128 is alsodisposed on the wafer stage 130, immediately adjacent to the wafer 126.The wafer stage 130 can be adjusted in three orthogonal directions, x,y, and z, where z is parallel to the optical axis 115, and x and y liein a plane substantially perpendicular to the optical axis 115. A waferstage drive 132 is included in the wafer stage 130 and contains hardwareto make the adjustments to the position of the wafer stage 130. A waferstage control 134 is electronically coupled to the wafer stage drive 132and is configured to transmit control data for controlling the positionof the wafer stage 130 and thus the wafer 126. The wafer stage control134 may also be configured to electronically receive wafer alignmentdata from TIS 128 to initially align wafer stage 130 before exposure ofwafer 126. The wafer stage control 134 includes a not-illustrateddigital processor, and a memory storing a computer program executed bythe processor, but could alternatively be implemented in some othermanner.

Lithography system 110 includes a spectrometer 136 that receives theportion of the beam 114 reflected by the beam splitter 124. Thespectrometer 136 measures the spectrum of the beam 114 andelectronically transmits spectrum data to the wafer stage control 134.The wafer stage control 134 is configured to receive and processspectrum data from the spectrometer 136. Alternatively, the spectrometeror some other processing structure may process the raw spectrum datainstead of the wafer stage control 124.

As noted in the discussion of FIG. 1, broadband light sources such asbroadband light source 112 are generally advantageous for improved depthof focus, but they may exhibit spectral shift over the course ofmultiple exposures (such as that from exposure 24 to exposure 28 in FIG.1), even if spectral width (as measured by E95) is maintained. Spectralshift may cause a shift in depth of focus at the point of wafer exposurewhich, if not compensated for, may result in uneven photoresist exposurein subsequent exposures. Uneven exposure may in turn lead to unwantedvariation in critical dimension (CD) at different pitches. In operation,the lithography system 110 dynamically compensates for spectral shift inthe beam 114 to improve wafer exposure results. More specifically, tocompensate for this shift and maintain through-pitch CD uniformity,lithography system 110 uses inline metrology to measure the spectrum ofbeam 114 during wafer exposure, and then may adjust the position ofwafer stage 130 based on the measured spectrum data.

In more detail, broadband light source 112 outputs the beam 114 alongthe optical axis 115 through the condenser lens 116, the reticle 118,the projection lens 122, and the beam splitter 124, and onto the wafer126. The light source 112 periodically emits the beam 114 in a series ofexposures, as needed to expose all exposure fields on wafer 114 andsubsequent wafers in a production run. During each exposure, a portionof the beam 114 is diverted by the beam splitter 124 to the spectrometer136 before beam 114 reaches the wafer 126. The spectrometer measures thespectrum of the beam 114 and sends spectrum data to the wafer stagecontrol 134. The wafer stage control 134 analyzes the spectrum output bythe light source 112 during the current exposure and compares it to aspectrum output during a past exposure, in a manner described in moredetail later. The wafer stage control 134 then determines a spectralshift from the comparison and calculates a distance and direction alongthe optical axis 115 that the wafer stage 130 needs to be moved tocompensate for the spectral shift. Next, based on the result of thecalculation, the wafer stage control 134 sends an adjustment signal tothe wafer stage drive 132, which in turn moves the wafer stage 130 alongthe optical axis 115. Adjustment to the wafer stage position occursafter the current exposure is finished and before another exposureoccurs. Alternatively, the adjustment may be made after a subsequentexposure and before the next wafer is positioned on the wafer stage 130.

FIG. 3 is a graph depicting two different spectral profiles 137 and 138of the broadband beam of radiation 114 emitted by lithography tool 110,as measured during two different exposures. The spectral profiles 137and 138 represent the intensity of each exposure as a function ofwavelength. The y-axis of the graph represents wavelength intensity andthe x-axis represents wavelength. However, for the sake of clarity,specific wavelength values on the x-axis have been replaced witharbitrary spectrum offset values to aid in measurement of spectraloffset.

Spectral profile 137, depicted with a solid line curve, represents theintensity of each wavelength in the beam's spectrum during a firstexposure. Likewise, spectral profile 138, depicted with a broken linecurve, represents the intensity of each wavelength in the beam'sspectrum during a subsequent exposure. For the purposes of clarity, thecurves are shown as smooth but in actuality are defined by a pluralityof raw data points gathered by inline metrology. Although not explicitlyindicated, the spectral widths of the two profiles are equal, wherespectral width is the distance in the x-axis direction betweensymmetrical points on the curve that encompass ninety-five percent ofthe spectral energy (E95). Further, each spectral profile has an E50intensity center, 139 or 141, which is defined as the wavelength in thespectral profile where the spectral energy on one side of the wavelengthis equal to the spectral energy on the other side of the wavelength. Inother words, E50 is the wavelength at 50% integral spectrum energy. TheE50 wavelength of spectral profile 137 is represented by a solidvertical line 139, and the E50 wavelength of spectral profile 138 isrepresented by a broken vertical line 141. It should be noted that thevalue of zero along the x-axis is arbitrarily set to the value of theE50 wavelength 139 for spectral profile 137.

As evident from the graph, the spectral profiles are offset, whichrepresents a spectral shift in the beam 114 between the first exposureand the subsequent exposure. The amount of the spectral offset (Δλ) isthe distance along the x-axis between the E50 wavelength 139 of profile137 and the E50 wavelength 141 of profile 138. As mentioned above, tocompensate for this spectral shift, the wafer stage 130 of thelithography tool 110 is adjusted along the optical axis 115 based onthis spectral shift. Specifically, the amount and direction ofadjustment along the optical axis 115 is calculated as a function of thespectral offset (Δλ) and a longitudinal aberration (constant C), usingthe equation: Δz=C * Δλ.

The data represented in the graph in FIG. 3 is a hypothetical examplefor explanation and illustration purposes only, but is representative ofwhat will actually be generated by the lithography system 110 of FIG. 2.

FIG. 4 is a high-level flowchart showing a process 140 for dynamicallyadjusting wafer stage 130 of lithography system 110 to compensate forspectral shift during wafer exposure. Process 140 is carried out by thelithography system 110 of FIG. 2 and implements the concepts discussedin association with the graph of FIG. 3. Process 140 begins at block142, and proceeds to block 144 where the constant C representinglongitudinal aberration of the optics of the lithography system 110 isdetermined. In this regard, every lithography tool has a distinctlongitudinal aberration constant, which is the distance along a tool'soptical axis from the focus of paraxial rays to the point where rayscoming from the outer edges of its lens or reflecting surface intersectthis axis. Longitudinal aberration values are typically in the range of0.2 to 0.5 μm/pm, and remain static for each lithography tool. ConstantC may be determined by configuring the light source 112 to output alight spectrum with a pre-determined center wavelength, and by thenusing the transmission image sensor (TIS) 128 to determine where alongthe optical axis 115 the beam 114 has its maximum intensity.Alternatively, C may be determined by any other suitable method.

Next, in block 146, a first wafer 126 is loaded onto the wafer stage 130and the lithography system 110 is properly focused and aligned forexposure with reticle 118. Calibration of the reticle stage 120 andwafer stage 130 in the x, y, and z directions may be performed with TIS128 or other suitable equipment, in a manner known in the art. Uponcompletion of appropriate calibration steps, a first exposure of thewafer 126 is initiated.

Process 140 proceeds to block 148, where, during the first exposure, thespectrum of the beam 114 is measured using inline metrology.Specifically, the beam splitter 124, disposed along the optical axis115, diverts a small portion of the beam 114 to the spectrometer 136. Adetailed spectral profile (or curve) is obtained from the rawspectrometer data by plotting measured wavelength intensity againstwavelength for each wavelength in the spectrum. This might, for example,be the sprectral profile 137 of FIG. 3. Next, in block 150, theintensity center of the spectral profile obtained in block 148 isdetermined (and is the wavelength at 50% integral spectral energy). InFIG. 3, this is the E50 wavelength 139. The E50 wavelength of theinitial spectrum reading is stored and saved for later calculations.

Then, process 140 proceeds to block 152 where the lithography system 110initiates a subsequent exposure, which is the exposure immediately afterthe first exposure. Then, in block 154, during the subsequent exposure,the beam splitter 124 again deflects a portion of the beam 114 to thespectrometer 136 to measure the spectrum a second time. A secondspectral profile is obtained from the second spectrum measurement andthe E50 wavelength for the second spectral profile is determined and isstored. In FIG. 3, this would be the spectral profile 138 and E50wavelength 141.

Process 140 proceeds to block 156 where a spectral shift of the beam, ifany, is determined. The spectral shift is determined by measuring theoffset between the intensity center of the first spectral profile (139and 137 in FIG. 3) and the intensity center of the second spectralprofile (141 and 138 in FIG. 3). Specifically, the difference betweenthe first E50 wavelength and the second E50 wavelength is calculated todetermine an E50 offset (Δλ). E50 offsets may be in the range of 0.2 pm,but larger or smaller offsets may occur depending on various factors,including the number of exposures between spectrum measurements.

Next, in block 158, the amount of wafer stage adjustment (Δz) needed tocompensate for spectral shift is determined. Specifically, the amountand direction of adjustment along the optical axis 115 is calculated asa function of E50 offset (Δλ) and longitudinal aberration (C), using theequation: Δz=C * Δλ. Then, in block 160, the wafer stage 130 is adjustedalong the optical axis 115 by an amount equal to the Δz value calculatedat block 158. The adjustment is made after the most recent exposure butbefore the next exposure is initiated. More generally, the adjustmentmay be made between any two exposures, for instance, while thelithography tool is aligning the optical axis 115 with another exposurefield on the wafer.

Then, in block 162, process 140 continues on to either block 163 orblock 164 depending on whether processing of the current wafer isfinished. If every exposure field on the wafer 114 has not been exposed,then process 140 proceeds to block 163 where the wafer stage 130 movesthe wafer 126 to align the next unexposed field with the optical axis115. If it is instead determined at decision block 162 that everyexposure field on the wafer 114 has been exposed, then process 140proceeds to block 164, where the next wafer is loaded onto the waferstage and aligned. From each of blocks 163 and 164, process 140 returnsto block 152 and another exposure is initiated. From there, process 140repeats blocks 154 through 162 to determine a new E50 offset, and toagain adjust the wafer stage 130 along the optical axis 115 tocompensate for any additional spectral shift. The iterative feedbackloop of blocks 152 through 164 continues until processing of every waferin the production run has been completed. As process 140 repeatedlyproceeds through this loop, the wafer stage 130 is dynamically adjustedalong the optical axis 115 to compensate for any measured spectralshift. Thus, depth of focus is maintained through successive exposuresand through-pitch critical dimension is substantially uniform.

The lithography system 110 may alternatively compensate for spectralshift with a combination of inline metrology data and alignment datafrom TIS 128. For example, during an exposure, TIS alignment dataindicating the intensity of the beam 114 at points along the z-axis maybe transmitted to the wafer stage control 134 or other processingstructure for analysis. The peak intensity of the beam along the z-axismay be calculated and compared to a previous TIS peak intensitymeasurement to produce a TIS offset value. This TIS offset value may beused in conjunction with the spectral offset value to adjust wafer stage130. For example, the amount of adjustment needed to wafer stage 130along the z-axis may be calculated by averaging the TIS offset value andthe Δz value corresponding to the spectral offset value (as calculatedin block 158 of FIG. 4). Other equations that are a function of both TISoffset and spectral offset may alternatively be utilized. Further, thelithography system 110 may additionally perform other adjustments to itsvarious components upon detection of spectral shift in beam 114.

FIG. 5 is a graph depicting the difference in critical dimension (CD)deviation at different pitch values between two alternative broadbandexposures. Each exposure was initiated after a common prior exposure.However, before one of the alternative exposures, the position of waferstage 130 was adjusted along the optical axis to compensate for spectralshift, whereas before the other alternative exposure, no such adjustmentwas made. In the graph, each data point represents the difference in CDat a specific pitch between the prior exposure and one alternativesubsequent exposure. For example, a data point 170 indicates that, at apitch of 120 nm, the CD of the second exposure (with no adjustment tothe wafer stage position) was approximately 1 nm greater than the CD ofthe common prior exposure. And a data point 172 indicates that, at apitch of 120 nm, the CD of an alternate second exposure (with adjustmentto the wafer stage position) was approximately 0.3 nm less than the CDof the prior exposure. As such, a curve 174 (defined by square datapoints) represents data collected after positional adjustment of waferstage 130 along the optical axis 115 in order to compensate for spectralshift. That is, an iteration of process 140 described in conjunctionwith FIG. 3 was carried out between two exposures. And a curve 176(defined by the diamond-shaped data points) represents data collectedduring an alternative subsequent exposure, where no positionaladjustment of the wafer stage is made between the successive exposures.

As evident from the graph, when a wafer is exposed to a broadband beamwithout any compensation for spectral shift, the critical dimensionvariation from a previous exposure may increase substantially at largerpitches. But when wafer stage adjustment is made before a subsequentexposure, critical dimension variation from a previous exposure may beless than or equal to 0.5 nm, even as pitch increases. The data in FIG.5 is representative of the improvement in critical dimension uniformityachieved by the lithography system 110 of FIG. 2 and the process 140 ofFIG. 4. However, data collected in practice may vary somewhat from thedata shown in the graph.

The foregoing discussion outlines one embodiment in detail so that thoseskilled in the art may better understand aspects of the presentdisclosure. Specifically, the lithography system 110 and process 140 asdescribed in conjunction with FIGS. 2 and 4 are solely to facilitate theunderstanding of the present disclosure and not to limit it. Thoseskilled in the art should appreciate that they may readily use thepresent disclosure as a basis for designing or modifying other processesand structures for carrying out the same purposes and/or achieving thesame advantages of the embodiment introduced herein. Accordingly,structure and procedures disclosed in the above embodiment may bemodified or added to, or removed without departing from the spirit andscope of the present disclosure. For example, the disclosure abovegenerally relates to a step-and-scan reduction projection typelithography system, but the lithography system 110 may include astep-and-repeat reduction projection scanner or other type of scannerwithout departure from the scope of the present disclosure.Additionally, the present disclosure may be applied not only tosemiconductor devices but also to image pickup devices, liquid crystaldisplays, and other applications that benefit from exposure with abroadband light source.

What is claimed is:
 1. A method comprising: aligning a first exposurefield along an optical axis, the first exposure field being supported bya workpiece support; directing a first beam of radiation, with optics ofa lithography tool, along the optical axis toward the first exposurefield, the optics of the lithography tool having a longitudinalaberration; measuring a spectrum of the first beam to obtain a firstspectral profile; aligning a second exposure field along the opticalaxis, the second exposure field being supported by the workpiecesupport; directing a second beam of radiation, with optics of thelithography tool, along the optical axis toward the second exposurefield; measuring the spectrum of the second beam to obtain a secondspectral profile; calculating a spectral offset between the first andsecond spectral profiles; calculating an adjustment amount based on thespectral offset and the longitudinal aberration; and adjusting aposition of the workpiece support along the optical axis by theadjustment amount.
 2. A method according to claim 1, includingconfiguring the first and second beams of radiation to each include abroadband range of wavelengths such that the beams have a spectral widthof at least approximately 1.2 picometers.
 3. A method according to claim1, including maintaining a spectral width of the beam that isapproximately constant.
 4. A method accordingly to claim 1, whereincalculating the spectral offset includes: determining a first intensitycenter of the first spectral profile; determining a second intensitycenter of the second spectral profile; and determining the spectraloffset between the intensity centers.
 5. A method according to claim 4,wherein the determining the first intensity center includes finding afirst wavelength in the first spectral profile such that spectral energyof the first spectral profile is approximately equal on each side of thefirst wavelength; and wherein the determining the second intensitycenter includes finding a second wavelength in the second spectralprofile such that spectral energy of the second spectral profile isapproximately equal on each side of the second wavelength.
 6. A methodaccording to claim 1, including: after the adjusting, aligning a thirdexposure field along the optical axis, the third exposure field beingsupported by the workpiece support; directing a third beam of radiation,with optics of the lithography tool, along the optical axis toward thethird exposure field; measuring the spectrum of the third beam to obtaina third spectral profile; calculating a further spectral offset betweenthe second and third spectral profiles; calculating a further adjustmentamount based on the further spectral offset and the longitudinalaberration; and adjusting the position of the workpiece support alongthe optical axis by the further adjustment amount.
 7. A method accordingto claim 1, wherein the measuring the spectrums of the first and secondbeams is carried out by sampling the first and second beams along theoptical axis.
 8. A method according to claim 7, wherein the measuringthe spectrums of the first and second beams is carried out by aspectrometer.
 9. A method according to claim 8, wherein measuring thespectrums of the first and second beams includes diverting portions ofthe first and second beams to the spectrometer with a beam splitterpositioned along the optical axis.
 10. A method according to claim 1,wherein the first and second exposure fields are portions of asemiconductor wafer supported by the workpiece support.
 11. A methodaccording to claim 10, wherein measuring the spectrum of the first beamis carried out during a first exposure of the wafer, measuring thespectrum of the second beam is carried out during a second exposure ofthe wafer after the first exposure, and the adjusting is carried outafter the second exposure but before a subsequent exposure.
 12. A methodcomprising: during a first exposure of a semiconductor wafer supportedby a workpiece support: directing a beam of radiation, with optics of alithography tool, along an optical axis toward the semiconductor wafer,the optics of the lithography tool having a longitudinal aberration; andmeasuring a spectrum of the beam to obtain a first spectral profile;during a second exposure subsequent to the first exposure of thesemiconductor wafer supported by the workpiece support: directing thebeam of radiation, with the optics of the lithography tool, along theoptical axis toward the semiconductor wafer; and measuring the spectrumof the beam to obtain a second spectral profile; determining a firstintensity center of the first spectral profile, determining a secondintensity center of the second spectral profile, and determining aspectral offset between the intensity centers; calculating an adjustmentamount based on the spectral offset and the longitudinal aberration; andadjusting a position of the workpiece support along the optical axis bythe adjustment amount.
 13. A method according to claim 12, wherein theadjusting is carried out after the second exposure but before asubsequent exposure.
 14. An apparatus comprising: a workpiece supportsupporting a semiconductor wafer having first and second exposurefields; beam directing structure that directs first and second beams ofradiation along an optical axis toward the respective first and secondexposure fields, wherein the beam directing structure includes opticsthat impart a longitudinal aberration to the first and second beamsalong the optical axis; spectrum measuring structure that measuresspectrums of the first and second beams to obtain respective first andsecond spectral profiles; processing structure that calculates aspectral offset between the first spectral profile and the secondspectral profile, and also calculates an adjustment amount based on thespectral offset and the longitudinal aberration; and support adjustingstructure that adjusts a position of the workpiece support along theoptical axis by the adjustment amount.
 15. An apparatus according toclaim 14, wherein the first and second beams of radiation each include abroadband range of wavelengths such that the first and second beams havea spectral width of at least approximately 1.2 picometers.
 16. Anapparatus according to claim 14, wherein the processing structuredetermines a first wavelength in the first spectral profile such thatspectral energy of the first spectral profile is approximately equal oneach side of the first wavelength, determines a second wavelength in thesecond spectral profile such that spectral energy of the second spectralprofile is approximately equal on each side of the second wavelength,and determines the spectral offset by determining an offset between thewavelengths.
 17. An apparatus according to claim 14, including alithography tool including the workpiece support, beam directingstructure, and support adjusting structure.
 18. An apparatus accordingto claim 14, wherein the spectrum measuring structure measures thespectrum of the first beam during an exposure of the first exposurefield and measures the spectrum of the second beam during an exposure ofthe second exposure field; and wherein the support adjusting structureadjusts the workpiece support position after the exposure of the secondexposure field but before a subsequent exposure.
 19. An apparatusaccording to claim 14, wherein the spectrum measuring structure measuresthe spectrum of a third beam during an exposure of a third exposurefield subsequent to the adjustment to obtain a third spectral profile;wherein the processing structure determines a further spectral offsetbetween the second spectral profile and the third spectral profile, andalso calculates a further adjustment amount based on the furtherspectral difference and the longitudinal aberration; and wherein thesupport adjusting structure adjusts the position of the workpiecesupport along the optical axis by the further adjustment amount.
 20. Anapparatus according to claim 14, wherein the spectrum measuringstructure includes a spectrometer and a beam splitter positioned alongthe optical axis to divert portions of the first and second beams to thespectrometer.